finfet metal gate
由WTu著作·2022—Themetalgate(MG)heightcomposedofcomplicatedworkfunctionmetal(WFM)filmsiscrucialtothedeviceandyieldperformanceattheFinFETTechnology.,由RMLuna-Sánchez著作·2006·被引用1次—TheTiN-gateCMOSFinFETtechnologiesforhigh-performanceconnected-d...
Investigation of metal-gate work
- metal gate material
- metal gate台積電
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- High-k metal gate
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- metal gate半導體
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由RSRathore著作·2017·被引用19次—Theorientationandworkfunctionofeachgrainisentirelyrandomthusmetalgateelectrodessufferfromtheworkfunctionvariability(WFV).Recently,for ...
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